RET/OPC Process Development Engineer

Overview In this role you will translate customer design intent into manufacturable layouts using advanced retargeting techniques, ensuring designs meet yield, performance, and manufacturability targets across nodes. You will collaborate with OPC, lithography, and process teams to optimize pattern transfer and tape-out readiness. You will refine retargeting rules through data analysis and imaging feedback while mentoring junior engineers. This role offers impact on next-generation nodes and cross-functional exposure to cutting-edge lithography and DTCO. Compensation / Benefitscompetitive pay and benefitswell-being programscareer development opportunities ResponsibilitiesDevelop and implement design retargeting strategies aligning design intent with process capabilitiesCollaborate with OPC, lithography, and process integration teams for reliable pattern transfer and high yieldAnalyze and modify layout geometries to improve printability and process window robustnessAutomate retargeting flows with EDA tools and integrate into tape-out pipelineSupport customer design enablement with feedback on layout constraints and manufacturability guidelinesPerform data analysis using CD metrology, SEM review, and simulation results to refine retargeting rulesContribute to development of design rules and patterning strategies for advanced nodes (28nm, 22nm)Mentor junior engineers and share knowledge within the team Key requirements5+ years of experience in design retargeting, OPC, or physical design in semiconductor/EDA environmentsStrong understanding of optical lithography, RET (OPC, SRA, assist features), and mask technologyHands-on experience with OPC tools (e.g., Synopsis Sentaurus Lithography, Mentor Calibre, ASML Brion)Proficiency in scripting with any scripting languagesFamiliarity with layout editing and verification tools (Calibre, Virtuoso, ICC2)Understanding of lithography, patterning, and process integration challenges in advanced nodesFamiliarity with 28nm/22nm process limitations and lithographic constraintsStrong analytical and problem-solving skillsExcellent communicationCross-functional collaborationSynopsis Sentaurus LithographyMentor CalibreASML Brion