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We are constantly innovating and adapting to Intel's next generation process technology and products as dictated by Moore's Law. To keep the process going, we work closely with engineers from Lithography, Process Integration, Device Physics, Circuit Design, and RET (Resolution Enhancement Technology) teams to understand and establish frame structures.
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Onto Innovation is a leader in process control, combining global scale with an expanded portfolio of leading-edge technologies that include: 3D metrology spanning the chip from nanometer-scale transistors to micron-level die-interconnects; macro defect inspection of wafers and packages; metal interconnect composition; factory analytics; and lithography for advanced semiconductor packaging.
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Develops electrical test vehicles and fabrication of electrical devices such as capacitors, Schottky diodes and transistors including process steps such as lithography, etch, deposition (dielectrics and metals), anneals and wet cleans.
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Extreme Ultraviolet Lithography, Semiconductor, EUV Lithography, EUV, Soft-X-Ray, EUVL, and Metrology. Extreme Ultraviolet Lithography, Semiconductor, EUV Lithography, EUV, Soft-X-Ray, EUVL, and Metrology.
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Technical expertise on photolithography platforms and be able to provide technical direction on lithography quality issues, lithography matching performance and lithography yield improvement.
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ASML US, including its affiliates and subsidiaries, brings together the most creative minds in science and technology to develop lithography machines that are key to producing faster, cheaper, more energy-efficient microchips.
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ASML US, including its affiliates and subsidiaries, bring together the most creative minds in science and technology to develop lithography machines that are key to producing faster, cheaper, more energy-efficient microchips.
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We provide inspection solutions to both the mask shops and the semiconductor fabs to ensure that lithography yields are consistently high, enabling cost-effective manufacturing. The company provides inspection solutions to both the mask shops and the semiconductor fabs to ensure that lithography yields are consistently high thus enabling cost-effective manufacturing.
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Technical depth in aspects of photo-lithography, etch, deposition, or similar tools and processes used for semiconductor manufacturing. Working knowledge of semiconductor fabrication processes, and expertise in photo-lithography, etch, deposition, and related processes.
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Contribute 5-10 years working experience in multiple optical manufacturing disciplines, such as: 5-axis CNC machining to form complex structures, lapping and polishing to figure optical surfaces, lithography or laser ablation to create sub-micron surface modulations, thermal processing for annealing and complex bonding technologies for ceramics and glasses.
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Experience or working knowledge of Lithography, PVD, CVD, CMP, and Dry Etch processing. Experience or working knowledge of Lithography, PVD, CVD, CMP, and Dry Etch processing. The Microelectronics Center within Northrop Grumman Mission Systems is seeking an exceptionally talented, motivated, and creative Semiconductor Process Engineering Wets and Advanced Materials Manager for our Advanced Technology Lab (ATL) - located outside of Baltimore, Maryland - where we design, manufacture, and test semiconductor products for internal and commercial production customers as well as emerging technology programs.
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ZEISS develops and distributes lithography optics, measuring technology, microscopes, medical technology, eyeglass lenses, camera and cine lenses, binoculars and planetarium technology. Optics, Optoelectronics and Precision Mechanics, Binoculars, Microscopy, Eyeglass Lenses, Biomedical Research, Medical Technology, Semiconductor Manufacturing Technology, Nano Technology, Industrial Metrology, Camera and Cine Lenses, Industry 4.0, Artificial Intelligence, Machine Learning, Software Engineering, and Software Development.
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Siemens EDA Calibre is developing the software used by the most advanced semiconductor manufacturers to enable the continued shrinkage of devices through computational lithography. Designing, developing, modifying, and implementing Calibre software products in the area of computational lithography.
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3+ years' experience preferred in an integrated circuit (IC) manufacturing environment with a technical background on lithography and/or on-product metrology, of which a minimum of 2 years in scanner, high-end DUV or EUV preferred.
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Knowledge of optics, semiconductor lithography, and IC design. Knowledge of optics, semiconductor lithography, and IC design. The job requires an understanding of the signal processing, Fourier optics, optical physics, modern optimization and machine learning algorithms, and C.
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lithography job
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